Please use this identifier to cite or link to this item: http://pandora.lib.unipi.gr/jspui/handle/unipi/1345
Title: On the use of stereolithography built photoelastic models for stress analysis investigations
Authors: 
Keywords: Photoelastic models
Stereolithography, Computer aided design
Computer simulation
Epoxy resins
Mathematical models
Numerical analysis
Photoelasticity
Rapid prototyping, Stress analysis, epoxy resin
photoelasticity
Issue Date: 2006
Publisher: Elsevier
Citation: Materials and Design, vol. 27 no. 2, pp. 100-106
URI: http://pandora.lib.unipi.gr/jspui/handle/unipi/1345
ISSN: 2613069
Appears in Collections:Δημοσιεύσεις σε Περιοδικά

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